A must-see for process engineers! International Conference on Extreme Ultraviolet Lithography 2023
Event Summary
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Date
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2023.10.02 - 2023.10.05
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Target
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Process Engineer
The International Conference on Extreme Ultraviolet Lithography 2023 will be held October 2-5 at the Monterey Convention Center in Monterey, California, USA! The conference will focus on Extreme Ultraviolet Lithography, which enables further miniaturization, and will cover the worldwide status of EUV technology and infrastructure readiness. Tokyo Electron (TEL), which has almost 100% market share of Coater/Developer for EUV lithography, will give five presentations, including co-authored projects with partners such as imec and IBM Corp!
Invited Paper
2 October 2023 1:40 PM - 2:00 PM PDT | Monterey Conv. Ctr., Steinbeck 3
Litho process development for pillars to enable high density 4f2 memory cells at 34nm pitch
M. Pak, imec
A. Dauendorffer, K. Nafus, Tokyo Electron Kyushu Ltd.
A. Das, M. Hasan, P. A. Rincon-Delgadillo, imec
4 October 2023 • 11:35 AM - 11:55 AM PDT | Monterey Conv. Ctr., Steinbeck 2/3
Coater/Developer-based patterning techniques to achieve tight pitches with 0.33 NA single exposure
K. Kato, L. Huli, N. Antonovich, D. Hetzer, A. Krawicz, N. Bae, E. Liu, A. Ko, TEL Technology Center, America, LLC
S. Shimura, S. Kawakami, D. Conque, Tokyo Electron Kyushu Ltd.
T. Kitano, S. Nagahara, Tokyo Electron Ltd.
L. Meli, I. Seshadri, M. Burkhardt, K. Petrillo, IBM Corp.
S. Grzeskowiak, TEL Technology Center, America, LLC
Presentation
2 October 2023 • 4:30 PM - 4:45 PM PDT | Monterey Conv. Ctr., Steinbeck 3
Advanced development for contact-holes of metal-oxide resists
C. Que Dinh, Tokyo Electron Kyushu Ltd.
S. Nagahara, Tokyo Electron Ltd.
K. Kato, TEL Technology Centert, America, LLC
S. Kawakami, Y. Kuwahara, K. Cho, S. Okada, Tokyo Electron Kyushu Ltd.
K. McInerney, L. Huli, TEL Technology Center, America, LLC
M. Muramatsu, Tokyo Electron Kyushu Ltd.
2 October 2023 • 6:00 PM - 7:30 PM PDT | Monterey Marriott, San Carlos Ballroom
Holistic litho-etch approach towards high NA EUV challenges
S. Okada, A. Dauendorffer, Y. Kuwahara, S. Shimura, Tokyo Electron Kyushu Ltd.
P. Foubert, D. De Simone, imec
C. Que Dinh, Tokyo Electron Kyushu Ltd.
A. Tsuboi, Tokyo Electron Ltd.
K. Nafus, Tokyo Electron America Inc.
4 October 2023 • 2:50 PM - 3:05 PM PDT | Monterey Conv. Ctr., Steinbeck 3
Analysis of dissolution modes of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions using decision trees and support vector machine
H. Betsumiya, Y. Jin, Y. T. Ito, T. Kozawa, SANKEN, Osaka Univ.
K. Sakamoto, M. Muramatsu, Tokyo Electron Kyushu Ltd.
